M. A. KHASKHELI; P WU, M S KALHORO; A. H. NIZAMANI; M. ELLAHI; M.U. KHAN; ASADULLAH. Electrical and Photonics Characteristics of Hftiero Thin Films Deposited at 673 K Substrate Temperature. Sindh University Research Journal - SURJ (Science Series), [S. l.], v. 45, n. 2, 2013. Disponível em: https://sujo.usindh.edu.pk/index.php/SURJ/article/view/5546. Acesso em: 12 aug. 2026.