Electrical and Photonics Characteristics of Hftiero Thin Films Deposited at 673 K Substrate Temperature. Sindh. Uni. Res. J. SS [Internet]. 2013 Jun. 3 [cited 2026 Nov. 5];45(2). Available from: https://sujo.usindh.edu.pk/index.php/SURJ/article/view/5546